TRIS(DIMETHYLAMINO)SILANE
- CasNo:15112-89-7
Product Description
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What is the TRIS(DIMETHYLAMINO)SILANE ?
TRIS(DIMETHYLAMINO)SILANE is colorless liq., while it's Molecular Formula is C6H19 N3 Si. Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.
What is the CAS number for TRIS(DIMETHYLAMINO)SILANE ?
The CAS number of TRIS(DIMETHYLAMINO)SILANE is 15112-89-7.
More information of TRIS(DIMETHYLAMINO)SILANE 15112-89-7 are:
|
Synonyms |
LS 1460;Tris(dimethylamino)silane |
|
CAS?Number |
15112-89-7 |
|
Molecular Formula |
C6H19 N3 Si |
|
Molecular Weight |
161.322 |
|
Density |
0,838 g/cm3 |
|
Melting Point |
<0°C |
|
Boiling Point |
139.8 °C at 760 mmHg |
|
Flash Point |
38.4 °C |
|
HS CODE |
2931900090 |
|
PSA |
9.72000 |
|
LogP |
-0.61160 |
|
Pka |
10.93±0.70(Predicted) |
What is TRIS(DIMETHYLAMINO)SILANE (15112-89-7) used for?
TRIS(DIMETHYLAMINO)SILANE, also known as TDMAS, is an organosilicon compound that serves as a versatile precursor for the deposition of various thin films, including Si oxynitride, carbonitride, nitride, and oxide. It is characterized by its suitable melting point and vapor pressure, which allow for efficient vapor deposition at low substrate temperatures (<150°C).
InChI:InChI=1/C6H18N3Si/c1-7(2)10(8(3)4)9(5)6/h1-6H3
Articles related to TRIS(DIMETHYLAMINO)SILANE:
|
Article |
Source |
|
Method for manufacturing of alkylaminosilane compound |
- Paragraph 0083-0085, (2021/04/29) |
|
Synthetic method for tris(dimethylamino)silane |
- Paragraph 0019-0021, (2019/07/16) |
How to get the best price on TRIS(DIMETHYLAMINO)SILANE?
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